Published June 30, 2003 | Version v1
Journal article

Thermodynamic study on compositional instability of InGaN/GaN and InGaN/InN during MBE

Description

Thermodynamic analyses were carried out to understand influence of lattice constraint from GaN and InN substrates on relationship between solid composition x of InxGa1-xN films and input mole ratio RIn (=PIn0/(PIn0+PGa0) where Pi0 is the input partial pressure of element i) during molecular beam epitaxy. The calculated results suggest that compositional unstable region is found at small RIn region for InGaN on InN while that for InGaN on GaN can be seen at large RIn region at higher temperatures. This implies that InN-rich thin films are possible to form on InN substrate though it is difficult to form on GaN substrate

Additional details

Identifiers

DOI
10.1016/S0169-4332(03)00396-9;
arXiv
arXiv:cond-mat/9903015v1;
PII
S0169433203003969;

Publishing Information

Journal Title
Applied Surface Science
Journal Volume
216
Journal Issue
1-4
Journal Page Range
p. 453-457
ISSN
0169-4332
CODEN
ASUSEE

Conference

Title
4. international symposium on the control of semiconductor interfaces
Dates
21-25 Oct 2002
Place
Karuizawa (Japan)

INIS

Country of Publication
Netherlands
Country of Input or Organization
International Atomic Energy Agency (IAEA)
INIS RN
38086779
Subject category
S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY;
Resource subtype / Literary indicator
Conference
Descriptors DEI
GALLIUM NITRIDES; INDIUM NITRIDES; MOLECULAR BEAM EPITAXY; PARTIAL PRESSURE; THERMODYNAMICS; THIN FILMS
Descriptors DEC
CRYSTAL GROWTH METHODS; EPITAXY; FILMS; GALLIUM COMPOUNDS; INDIUM COMPOUNDS; NITRIDES; NITROGEN COMPOUNDS; PHYSICAL PROPERTIES; PNICTIDES; THERMODYNAMIC PROPERTIES

Optional Information

Copyright
Copyright (c) 2003 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.