Phase-shifting electron holography for accurate measurement of potential distributions in organic and inorganic semiconductors
- 1. Japan Fine Ceramics Center, Nanostructures Research Laboratory, Nagoya, Aichi (Japan)
- 2. Hitachi High-Tech Corporation, Nano-Technology Solution Business Group, Hitachinaka, Ibaraki (Japan)
- 3. Iwate University, Faculty of Science and Engineering, Morioka, Iwate (Japan)
Description
Phase-shifting electron holography (PS-EH) is an interference transmission electron microscopy technique that accurately visualizes potential distributions in functional materials, such as semiconductors. In this paper, we briefly introduce the features of the PS-EH that overcome some of the issues facing the conventional EH based on Fourier transformation. Then, we present a high-precision PS-EH technique with multiple electron biprisms and a sample preparation technique using a cryo-focused-ion-beam, which are important techniques for the accurate phase measurement of semiconductors. We present several applications of PS-EH to demonstrate the potential in organic and inorganic semiconductors and then discuss the differences by comparing them with previous reports on the conventional EH. We show that in situ biasing PS-EH was able to observe not only electric potential distribution but also electric field and charge density at a GaAs p-n junction and clarify how local band structures, depletion layer widths and space charges changed depending on the biasing conditions. Moreover, the PS-EH clearly visualized the local potential distributions of two-dimensional electron gas layers formed at AlGaN/GaN interfaces with different Al compositions. We also report the results of our PS-EH application for organic electroluminescence multilayers and point out the significant potential changes in the layers. The proposed PS-EH enables more precise phase measurement compared to the conventional EH, and our findings introduced in this paper will contribute to the future research and development of high-performance semiconductor materials and devices. (author)
Availability note (English)
Available from DOI: https://doi.org/10.1093/jmicro/dfaa061Additional details
Identifiers
Publishing Information
- Journal Title
- Microscopy (Online)
- Journal Volume
- 70
- Journal Issue
- 1
- Journal Page Range
- p. 24-38
- ISSN
- 2050-5701
INIS
- Country of Publication
- Japan
- Country of Input or Organization
- Japan
- INIS RN
- 52113273
- Subject category
- S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY;
- Descriptors DEI
- CHARGE DENSITY; CHARGE DISTRIBUTION; ELECTRIC FIELDS; ELECTROMAGNETIC RADIATION; ELECTROMAGNETISM; ELECTRON BEAMS; FOURIER TRANSFORMATION; HOLOGRAPHY; INTERFERENCE; ORGANIC SEMICONDUCTORS; PHASE SHIFT; SPATIAL RESOLUTION; TRANSMISSION ELECTRON MICROSCOPY; X-RAY PHOTOELECTRON SPECTROSCOPY
- Descriptors DEC
- BEAMS; ELECTRON MICROSCOPY; ELECTRON SPECTROSCOPY; INTEGRAL TRANSFORMATIONS; LEPTON BEAMS; MAGNETISM; MATERIALS; MICROSCOPY; PARTICLE BEAMS; PHOTOELECTRON SPECTROSCOPY; RADIATIONS; RESOLUTION; SEMICONDUCTOR MATERIALS; SPECTROSCOPY; TRANSFORMATIONS
Optional Information
- Notes
- 62 refs., 11 figs.