Published May 15, 2005 | Version v1
Journal article

Epitaxial PtMn/NiFe exchange-biased bilayers containing directly deposited ordered PtMn

  • 1. Clarendon Laboratory, University of Oxford, Parks Road, Oxford, OX1 3PU (United Kingdom)
  • 2. Department of Materials, University of Oxford, Parks Road, Oxford, OX1 3PH (United Kingdom)

Description

PtMn/NiFe exchange-biased bilayers have been grown epitaxially on Si (001) using molecular-beam epitaxy. Spontaneous formation of the chemically ordered face-centered-tetragonal phase of PtMn layer was confirmed without postgrowth magnetic-field annealing, whose Neel axis is perpendicular to the PtMn/NiFe interface. The exchange anisotropy field stabilizes above a PtMn thickness of 15 nm which is much lower than that for polycrystalline PtMn-based exchange-biased systems. For comparison, PtMn/NiFe exchange-biased bilayers have been prepared epitaxially on MgO (001) substrate. Spontaneous formation of the chemically ordered PtMn layer was also confirmed with Neel axis parallel to the PtMn/NiFe interface. The exchange anisotropy field of the bilayer on MgO stabilizes beyond a PtMn thickness of 15 nm as well

Additional details

Identifiers

Publishing Information

Journal Title
Journal of Applied Physics
Journal Volume
97
Journal Issue
10
Journal Page Range
p. 10C512-10C512.3
ISSN
0021-8979
CODEN
JAPIAU

Conference

Title
49. annual conference on magnetism and magnetic materials
Dates
7-11 Nov 2004
Place
Jacksonville, FL (United States)

Optional Information

Notes
(c) 2005 American Institute of Physics