The research on a physical model and an analytical method of scatter signal in X-ray profile gauge

There are more active researches on X-ray profile gauge with some useful properties including being more adaptive to harsh workplace and more precise when compared to other profile gauges. However, Scatter is a factor that degrades the measurement precision of X-ray profile gauge, the study about scatter correction is an indispensable step for the technology. We take an analytical method to correct it after making a physical model. The results obtained by this approach agree well with those using Monte Carlo simulation. (authors)