Published August 28, 2020 | Version v1
Journal article

Enhanced performance of In2O3 nanowire field effect transistors with controllable surface functionalization of Ag nanoparticles

  • 1. Hubei Key Laboratory for High-efficiency Utilization of Solar Energy and Operation Control of Energy Storage System, Hubei University of Technology, Wuhan 430068 (China)
  • 2. Department of Electrical and Computer Engineering, George Mason University, Fairfax 22030 (United States)

Description

Indium oxide (In2O3) nanowire field effect transistors (FETs) have great potential in electronic and sensor applications owing to their suitable band width and high electron mobility. However, the In2O3 nanowire FETs reported previously were operated in a depletion-mode, not suitable to the integrated circuits result of the high-power consumption. Therefore, tuning the electrical properties of In2O3 nanowire FETs into enhancement-mode is critical for the successful application in the fields of high-performance electronics, optoelectronics and detectors. In the work, a simple but effective strategy was carried out by preparing Ag nanoparticle functionalized In2O3 NWs to regulate the threshold voltage (Vth) of In2O3 NW FETs, successfully achieving enhanced-mode devices. The threshold voltage can be regulated from −6.9 V to +7 V by controlling Ag density via deposition time. In addition, the devices exhibited high performance: huge Ion/Ioff ratio > 108, large maximum saturation current ≈ 800 mA and excellent carrier mobility ≈ 129 cm2 Vċs−1. The enhanced performance is attributed to the surface passivation by Ag nanoparticles to reduce the density of traps and the charge transfer between traps and the nanowires to regulate the Vth. The result indicates the application of metal nanoparticles significantly improve oxide NW for low-power FETs. (paper)

Availability note (English)

Available from http://dx.doi.org/10.1088/1361-6528/ab8f4a

Additional details

Identifiers

Publishing Information

Journal Title
Nanotechnology (Print)
Journal Volume
31
Journal Issue
35
Journal Page Range
[10 p.]
ISSN
0957-4484