High fluence implantation in glasses: chemical interactions

Results will be given on chemical interactions in amorphous SiO2 implanted with reactive and non-reactive species. Samples were implanted with nitrogen, silicon, titanium and silver; a set of samples already implanted with these elements (excluding those implanted with nitrogen) has been subjected to a second implant with nitrogen ions, at the dose of 2x1017 ions cm-2, at different energies. Samples have been characterized by secondary ion mass spectrometry, X-ray photoelectron spectroscopy, nuclear techniques and optical absorption measurements. Radiation damage and chemical effects have been discriminated; precipitation of the implanted species, as well as chemical compound formation in the interaction both between the implanted species and the host matrix and between the implanted species themselves have been detected. (orig.)