Flip chip bumping technology-Status and update
- 1. Fraunhofer IZM, Gustav-Meyer-Allee 25, 13355 Berlin (Germany)
Description
Flip chip technology is a key driver for new complex system architectures and high-density packaging, e.g. sensor or pixel devices. Bumped wafers/dice as key elements become very important in terms of general availability at low cost, high yield and quality level. Today, different materials, e.g. Au, Ni, AuSn, SnAg, SnAgCu, SnCu, etc., are used for flip chip interconnects and different bumping approaches are available. Electroplating is the technology of choice for high-yield wafer bumping for small bump sizes and pitches. Lead-free solder bumps require an increase in knowledge in the field of under bump metallization (UBM) and the interaction of bump and substrate metallization, the formation and growth of intermetallic compounds (IMCs) during liquid- and solid-phase reactions. Results of a new bi-layer UBM of Ni-Cu which is especially designed for small-sized lead-free solder bumps will be discussed
Additional details
Identifiers
- DOI
- 10.1016/j.nima.2006.05.046;
- PII
- S0168-9002(06)00772-8;
Publishing Information
- Journal Title
- Nuclear Instruments and Methods in Physics Research. Section A, Accelerators, Spectrometers, Detectors and Associated Equipment
- Journal Volume
- 565
- Journal Issue
- 1
- Journal Page Range
- p. 290-295
- ISSN
- 0168-9002
- CODEN
- NIMAER
Conference
- Title
- International workshop on semiconductor pixel detectors for particles and imaging
- Acronym
- PIXEL 2005
- Dates
- 5-8 Sep 2005
- Place
- Bonn (Germany)
INIS
- Country of Publication
- Netherlands
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 38032204
- Subject category
- S36: MATERIALS SCIENCE;
- Resource subtype / Literary indicator
- Conference
- Descriptors DEI
- DENSITY; ELECTROPLATING; EQUIPMENT; INTERMETALLIC COMPOUNDS; LAYERS; LEAD; LIQUIDS; SOLIDS; SUBSTRATES
- Descriptors DEC
- ALLOYS; DEPOSITION; ELECTRODEPOSITION; ELECTROLYSIS; ELEMENTS; FLUIDS; LYSIS; METALS; PHYSICAL PROPERTIES; PLATING; SURFACE COATING
Optional Information
- Copyright
- Copyright (c) 2006 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.