Published September 1, 2006 | Version v1
Journal article

Flip chip bumping technology-Status and update

  • 1. Fraunhofer IZM, Gustav-Meyer-Allee 25, 13355 Berlin (Germany)

Description

Flip chip technology is a key driver for new complex system architectures and high-density packaging, e.g. sensor or pixel devices. Bumped wafers/dice as key elements become very important in terms of general availability at low cost, high yield and quality level. Today, different materials, e.g. Au, Ni, AuSn, SnAg, SnAgCu, SnCu, etc., are used for flip chip interconnects and different bumping approaches are available. Electroplating is the technology of choice for high-yield wafer bumping for small bump sizes and pitches. Lead-free solder bumps require an increase in knowledge in the field of under bump metallization (UBM) and the interaction of bump and substrate metallization, the formation and growth of intermetallic compounds (IMCs) during liquid- and solid-phase reactions. Results of a new bi-layer UBM of Ni-Cu which is especially designed for small-sized lead-free solder bumps will be discussed

Additional details

Identifiers

DOI
10.1016/j.nima.2006.05.046;
PII
S0168-9002(06)00772-8;

Publishing Information

Journal Title
Nuclear Instruments and Methods in Physics Research. Section A, Accelerators, Spectrometers, Detectors and Associated Equipment
Journal Volume
565
Journal Issue
1
Journal Page Range
p. 290-295
ISSN
0168-9002
CODEN
NIMAER

Conference

Title
International workshop on semiconductor pixel detectors for particles and imaging
Acronym
PIXEL 2005
Dates
5-8 Sep 2005
Place
Bonn (Germany)

INIS

Country of Publication
Netherlands
Country of Input or Organization
International Atomic Energy Agency (IAEA)
INIS RN
38032204
Subject category
S36: MATERIALS SCIENCE;
Resource subtype / Literary indicator
Conference
Descriptors DEI
DENSITY; ELECTROPLATING; EQUIPMENT; INTERMETALLIC COMPOUNDS; LAYERS; LEAD; LIQUIDS; SOLIDS; SUBSTRATES
Descriptors DEC
ALLOYS; DEPOSITION; ELECTRODEPOSITION; ELECTROLYSIS; ELEMENTS; FLUIDS; LYSIS; METALS; PHYSICAL PROPERTIES; PLATING; SURFACE COATING

Optional Information

Copyright
Copyright (c) 2006 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.