Published December 15, 2008 | Version v1
Journal article

ToF-SIMS study of growth behavior in all-nanoparticle multilayer films using a novel indicator layer

  • 1. Department of Chemistry, National Tsing Hua University, Hsinchu 30013, Taiwan (China)

Description

All-nanoparticle multilayer films found novel applications in the areas of photonics, catalysis, sensors, and biomaterials. The assembly of nanoparticles into conformal and uniform films with precise control over chemical and physical properties poses a significant challenge. Using time-of-flight secondary ion mass spectrometry (ToF-SIMS), we have investigated the growth behavior in all-nanoparticle multilayer films using a novel indicator layer. The all-nanoparticle multilayer films were prepared by dipping the polyester substrate with electrostatic charges alternatively into solutions containing three different types of nanoparticles (TiO2, Al2O3, and SiO2). Upon the deposition of each layer, ToF-SIMS was employed to determine the surface chemical composition of intermediate products. The intermixing extent of TiO2 indicator layer was used to reveal the stratification of each layer. Combining with zeta-potential measurements, the solvation and deposition of the under-layer species in the aqueous environment during fresh layer formation was proposed as a plausible cause for mutilayers not stratified into well-defined layers but displaying a nonlinear growth behavior.

Availability note (English)

Available from http://dx.doi.org/10.1016/j.apsusc.2008.05.036

Additional details

Identifiers

DOI
10.1016/j.apsusc.2008.05.036;
PII
S0169-4332(08)01122-7;

Publishing Information

Journal Title
Applied Surface Science
Journal Volume
255
Journal Issue
4
Journal Page Range
p. 977-980
ISSN
0169-4332
CODEN
ASUSEE

Conference

Title
16. international conference on secondary ion mass spectrometry
Acronym
SIMS 16
Dates
29 Oct - 2 Nov 2007
Place
Ishikawa Ongakudo, Kanazawa (Japan)

Optional Information

Copyright
Copyright (c) 2008 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.