Published August 2007
| Version v1
Journal article
Application of highly charged ions. Application of highly charged ions for nanotechnology
Description
The characteristics of interaction of highly charged ion to material surface are described. Next, several investigations as the topics related to nanotechnology are outlined, (1) a nanostructure is formed at a material surface by the irradiation of highly charged ion or composite processes (2) a highly charged ion is processed to an ion beam of nanometer size and the ion implantation is achieved with a single-ion in the semiconductor process (single-ion implantation) (3) the secondary electron and secondary ion occurred by the collision of highly charged ion are applied to surface analysis. (M.H.)
Additional details
Publishing Information
- Journal Title
- Purazuma, Kaku Yugo Gakkai-Shi
- Journal Volume
- 83
- Journal Issue
- 8
- Journal Page Range
- p. 684-689
- ISSN
- 0918-7928
INIS
- Country of Publication
- Japan
- Country of Input or Organization
- Japan
- INIS RN
- 39013160
- Subject category
- S36: MATERIALS SCIENCE; S37: INORGANIC, ORGANIC, PHYSICAL AND ANALYTICAL CHEMISTRY;
- Descriptors DEI
- ELECTRON EMISSION; ION BEAMS; ION EMISSION; ION IMPLANTATION; IRRADIATION; MASS SPECTROSCOPY; MULTICHARGED IONS; NANOSTRUCTURES; SECONDARY EMISSION; SURFACE IONIZATION
- Descriptors DEC
- BEAMS; CHARGED PARTICLES; EMISSION; IONIZATION; IONS; SPECTROSCOPY
Optional Information
- Notes
- 55 refs., 7 figs.