Angular distributions of atoms sputtered with Ar+ ions from Ag target
Creators
- 1. Academia Sinica, Shanghai, SH (China). Shanghai Inst. of Nuclear Research
- 2. Shanghai Inst. of Semiconductor Device (China)
- 3. Academia Sinica, Shanghai, SH (China). Shanghai Inst. of Metallurgy
Description
The experimental method is discribed for measuring angular dostributions of sputtered particles using a sputtered particle collector and Rutherford backscattering analysis. The angular diatributions are given for 100keV Ar+ions sputtering of Ag at incident angles of 0 deg, 30 deg, 50 deg, and 80 deg. The angular diatributions have large deviations from the cosine distribution and show an anisotropy with a preferred emission in forward direction with respect to the beam. The differential sputtering yield increases rapidly with increasing angle of incidence. The total sputtering yield calculated from the angular distribution for 50 keV Ar+ sputtering of Ag is 16.8±2.4 atoms/ion and compared with theoretical values. Finally, the results are discussed qualitatively
Additional details
Publishing Information
- Journal Title
- Nuclear Techniques
- Journal Volume
- 11
- Journal Issue
- 5
- Series
- Nucl. Tech.
- Journal Page Range
- 21-23
- ISSN
- 0253-3219
- CODEN
- NUTED
INIS
- Country of Publication
- China
- Country of Input or Organization
- China
- INIS RN
- 20073346
- Subject category
- S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY;
- Descriptors DEI
- ANGULAR DISTRIBUTION; ARGON IONS; BACKSCATTERING; COMPARATIVE EVALUATIONS; HIGH VACUUM; INCIDENCE ANGLE; KEV RANGE 10-100; RUTHERFORD SCATTERING; SILVER; SPUTTERING; TARGETS
- Descriptors DEC
- CHARGED PARTICLES; DISTRIBUTION; ELASTIC SCATTERING; ELEMENTS; ENERGY RANGE; EVALUATION; IONS; KEV RANGE; METALS; SCATTERING; TRANSITION ELEMENTS