Pd thin films on flexible substrate for hydrogen sensor
Creators
- 1. Fatih Sultan Mehmet Vakıf University, Engineering Faculty, Istanbul (Turkey)
- 2. Nigde University, Nanotechnology Application and Research Center, 51245 Nigde (Turkey)
- 3. Nigde University, Mechatronics Engineering Department, 51245 Nigde (Turkey)
Description
In this work, palladium (Pd) thin films were prepared via RF sputtering method with various thicknesses (6 nm, 20 nm and 60 nm) on both a flexible substrate and a hard substrate. Hydrogen (H2) sensing properties of Pd films on flexible substrate have been investigated depending on temperatures (25–100 °C) and H2 concentrations (600 ppm – 10%). The effect of H2 on structural properties of the films was also studied. The films were characterized by Scanning Electron Microscopy (SEM) and X-ray diffraction. It is found that whole Pd films on hard substrate show permanent structural deformation after exposed to 10% H2 for 30 min. But, this H2 exposure does not causes any structural deformation for 6 nm Pd film on flexible substrate and 6 nm Pd film on flexible substrate shows reversible sensor response up to 10% H2 concentration without any structural deformation. On the other hand, Pd film sensors that have the thicknesses 20 nm and 60 nm on flexible substrate are irreversible for higher H2 concentration (>2%) with film deformation. The sensor response of 6 nm Pd film on flexible substrate increased with increasing H2 concentration up 4% and then saturated. The sensitivity of the film decreased with increasing operation temperature. - Highlights: • Pd thin films fabricated by RF sputtering on both flexible and hard substrates. • Structural deformation observed for films on hard substrate after exposing 10% H2. • 6 nm Pd film on flexible substrate shows reversible sensor response up to 10% H2. • H2 sensing properties of film on flexible substrate investigated depending on temperature and concentration. • The sensitivity of the film decreased with increasing operation temperature.
Availability note (English)
Available from http://dx.doi.org/10.1016/j.jallcom.2016.03.042Additional details
Identifiers
- DOI
- 10.1016/j.jallcom.2016.03.042;
- PII
- S0925-8388(16)30599-0;
Publishing Information
- Journal Title
- Journal of Alloys and Compounds
- Journal Volume
- 674
- Journal Page Range
- p. 179-184
- ISSN
- 0925-8388
- CODEN
- JALCEU
INIS
- Country of Publication
- Netherlands
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 48060184
- Subject category
- S36: MATERIALS SCIENCE;
- Descriptors DEI
- CONCENTRATION RATIO; DEFORMATION; HYDROGEN; PALLADIUM; SCANNING ELECTRON MICROSCOPY; SENSITIVITY; SENSORS; SPUTTERING; SUBSTRATES; THICKNESS; THIN FILMS; X-RAY DIFFRACTION
- Descriptors DEC
- COHERENT SCATTERING; DIFFRACTION; DIMENSIONLESS NUMBERS; DIMENSIONS; ELECTRON MICROSCOPY; ELEMENTS; FILMS; METALS; MICROSCOPY; NONMETALS; PLATINUM METALS; SCATTERING; TRANSITION ELEMENTS
Optional Information
- Copyright
- Copyright (c) 2016 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.