Published January 2006 | Version v1
Journal article

Development of large area imaging detector using thick CdTe layers grown by metalorganic vapor phase epitaxy

  • 1. Nagoya Inst. of Technology, Graduate School of Engineering, Nagoya, Aichi (Japan)

Description

Growth characteristics and electronic properties of thick CdTe layers grown by metalorganic vapor phase epitaxy were studied for the application to large-area nuclear radiation imaging devices. High quality CdTe layers were grown on GaAs substrates above the thickness of 100 μm. Detection of γ-ray (60keV) from 241Am were confirmed with p-CdTe/n-CdTe/n+-GaAs diode detectors. Direct growth of high quality CdTe layers on Si substrates was also achieved. p-CdTe/n-CdTe/n+-Si diodes showed promising electronic properties for detector fabrication. (author)

Additional details

Publishing Information

Journal Title
Hoshasen
Journal Volume
32
Journal Issue
1
Journal Page Range
p. 3-9
ISSN
0285-3604

Optional Information

Notes
7 refs., 12 figs., 1 tab.