Published July 2015 | Version v1
Journal article

Time-resolved measurements of the adsorption/desorption of Rb atoms on octadecyltrichlorosilane coated surfaces

  • 1. Applied Ion Beam Physics Laboratory (Ministry of Education), Fudan University, Shanghai (China)
  • 2. Institute of Modern Physics, Department of Nuclear Science and Technology, Fudan University, Shanghai (China)

Description

We carry out the first time-resolved measurement of Rb atoms desorbing from octadecyltrichlorosilane coated surfaces by polarizing the atoms near the surface using an evanescent wave pump pulse and watching the subsequent intensity change of another evanescent wave probe beam, and find the mean adsorption (dwell) time to be about 400 ns at a cell body temperature of 112 ℃. The adsorption energy is found to be 0.19 eV from the surface temperature dependence of the adsorption time. This method can be extended to study the adsorption/desorption process of other alkali atoms on other surfaces of transparent substrates with an ultimate time resolution limited by the flight time of atoms in the evanescent wave which is of the order of nanoseconds. (authors)

Additional details

Publishing Information

Journal Title
Chinese Physics Letters
Journal Volume
32
Journal Issue
7
Journal Page Range
[3 p.]
ISSN
0256-307X

INIS

Country of Publication
China
Country of Input or Organization
China
INIS RN
51120646
Subject category
S36: MATERIALS SCIENCE;
Descriptors DEI
ADSORPTION; ATOMS; BODY TEMPERATURE; DESORPTION; ORGANIC SILICON COMPOUNDS; PULSES; RUBIDIUM; SUBSTRATES; SURFACES; TIME RESOLUTION
Descriptors DEC
ALKALI METALS; ELEMENTS; METALS; ORGANIC COMPOUNDS; RESOLUTION; SORPTION; TIMING PROPERTIES

Optional Information

Notes
3 figs., 14 refs.; http://dx.doi.org/10.1088/0256-307X/32/7/076801