Time-resolved measurements of the adsorption/desorption of Rb atoms on octadecyltrichlorosilane coated surfaces
- 1. Applied Ion Beam Physics Laboratory (Ministry of Education), Fudan University, Shanghai (China)
- 2. Institute of Modern Physics, Department of Nuclear Science and Technology, Fudan University, Shanghai (China)
Description
We carry out the first time-resolved measurement of Rb atoms desorbing from octadecyltrichlorosilane coated surfaces by polarizing the atoms near the surface using an evanescent wave pump pulse and watching the subsequent intensity change of another evanescent wave probe beam, and find the mean adsorption (dwell) time to be about 400 ns at a cell body temperature of 112 ℃. The adsorption energy is found to be 0.19 eV from the surface temperature dependence of the adsorption time. This method can be extended to study the adsorption/desorption process of other alkali atoms on other surfaces of transparent substrates with an ultimate time resolution limited by the flight time of atoms in the evanescent wave which is of the order of nanoseconds. (authors)
Additional details
Identifiers
Publishing Information
- Journal Title
- Chinese Physics Letters
- Journal Volume
- 32
- Journal Issue
- 7
- Journal Page Range
- [3 p.]
- ISSN
- 0256-307X
INIS
- Country of Publication
- China
- Country of Input or Organization
- China
- INIS RN
- 51120646
- Subject category
- S36: MATERIALS SCIENCE;
- Descriptors DEI
- ADSORPTION; ATOMS; BODY TEMPERATURE; DESORPTION; ORGANIC SILICON COMPOUNDS; PULSES; RUBIDIUM; SUBSTRATES; SURFACES; TIME RESOLUTION
- Descriptors DEC
- ALKALI METALS; ELEMENTS; METALS; ORGANIC COMPOUNDS; RESOLUTION; SORPTION; TIMING PROPERTIES
Optional Information
- Notes
- 3 figs., 14 refs.; http://dx.doi.org/10.1088/0256-307X/32/7/076801