Published December 1993
| Version v1
Journal article
Step-coverage simulation for molybdenum silicide sputtering film
- 1. Toyama Univ. (Japan). Faculty of Engineering
Description
Step-coverage calculation for molybdenum silicide films was carried out using a model constructed by modifying the string model often used for the calculation of aluminum film step coverage. In the model, the film composition around steps as well as the thickness can be calculated. It was concluded that the difference between the angular distribution of the Mo atom and that of the Si atom caused not only the nonuniformity of the film composition at flat surface but also the deviation of the film composition around steps from that at flat surface. (author)
Additional details
Publishing Information
- Journal Title
- Japanese Journal of Applied Physics. Part 2, Letters
- Journal Volume
- 32
- Journal Issue
- 12 A
- Journal Page Range
- p. L1764-L1766.
- ISSN
- 0021-4922
- CODEN
- JAPLD8
INIS
- Country of Publication
- Japan
- Country of Input or Organization
- Japan
- INIS RN
- 25048862
- Subject category
- S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY;
- Descriptors DEI
- ANGULAR DISTRIBUTION; COMPUTERIZED SIMULATION; EROSION; MOLYBDENUM; MOLYBDENUM SILICIDES; SILICON; SPUTTERING; SURFACE TREATMENTS; THICKNESS; THIN FILMS
- Descriptors DEC
- DIMENSIONS; DISTRIBUTION; ELEMENTS; FILMS; METALS; MOLYBDENUM COMPOUNDS; SEMIMETALS; SILICIDES; SILICON COMPOUNDS; SIMULATION; TRANSITION ELEMENT COMPOUNDS; TRANSITION ELEMENTS