Published 1994 | Version v1
Book

Interaction of slow highly charged ions with surfaces

Creators

  • 1. Technische Universitaet Wien (Austria)

Description

A review will be presented on recent investigations concerning the interaction of slow (≤ 106 m/s) ions in high charge states approaching a clean metal surface. Detailed information on the generation and decay of transiently formed multiply excited open-quotes hollow atomsclose quotes can be gained from the measurement of total yields and energy distributions of emitted electrons and, in particular, from the electron emission statistics. By comparing measured results with model calculations based on a recently extended classical over-barrier approach, different sources for the observed electron emission can be identified: autoionisation of the multiply excited hollow atoms on their way toward the surface; promotion above the vacuum barrier of electrons previously captured by the projectile, due to their self- and image-charge screening near the surface; 'peeling-off' of electrons still bound in highly excited projectile states at the moment of surface impact, and finally; electron emission due to final subsurface de-excitation

Additional details

Publishing Information

Publisher
University of North Texas.
Imprint Place
Denton, TX (United States)
Imprint Title
Thirteenth international conference on the application of accelerators in research and industry
Imprint Pagination
201 p.
Journal Page Range
p. 73a.

Conference

Title
13. international conference on the application of accelerators in research and industry.
Dates
7-10 Nov 1994.
Place
Denton, TX (United States).

INIS

Country of Publication
United States
Country of Input or Organization
United States
INIS RN
27040179
Subject category
S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY;
Resource subtype / Literary indicator
Conference
Descriptors DEI
AUTOIONIZATION; ELECTRON LOSS; ION COLLISIONS; IONS; METALS; SURFACES
Descriptors DEC
CHARGED PARTICLES; COLLISIONS; ELEMENTS; IONIZATION

Optional Information

Secondary number(s)
CONF-941129--.