Published January 2013
| Version v1
Journal article
A reactive molecular dynamic simulation of oxidation of a silicon nanocluster
Creators
- 1. Chinese Academy of Sciences, Institute of Process Engineering (China)
- 2. Queen Mary, University of London, School of Engineering and Material Science (United Kingdom)
Description
This study presents an atomic level of molecular dynamic simulation of oxidation of silicon nanoparticle in use of a reactive force field (ReaxFF). The oxidation dynamics is revealed through the energy release, bond evolution and oxygen exchange processes. The oxidation is found to proceed in the manner of evolution of silicon–oxygen bond configuration, accompanied by the oxygen exchange process. The heat of reaction and the activation energy of the bond transformation process are also estimated, which indicates the capability of ReaxFF in the simulation of energetic materials.
Additional details
Identifiers
Publishing Information
- Journal Title
- Journal of Nanoparticle Research
- Journal Volume
- 15
- Journal Issue
- 1
- Journal Page Range
- p. 1-11
- ISSN
- 1388-0764
INIS
- Country of Publication
- Netherlands
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 44058433
- Subject category
- S77: NANOSCIENCE AND NANOTECHNOLOGY;
- Descriptors DEI
- ACTIVATION ENERGY; ATOMIC CLUSTERS; EVOLUTION; NANOSTRUCTURES; OXIDATION; OXYGEN; REACTION HEAT; SILICON; SIMULATION
- Descriptors DEC
- CHEMICAL REACTIONS; ELEMENTS; ENERGY; ENTHALPY; NONMETALS; PHYSICAL PROPERTIES; SEMIMETALS; THERMODYNAMIC PROPERTIES
Optional Information
- Copyright
- Copyright (c) 2013 Springer Science+Business Media Dordrecht