Published April 1, 2014 | Version v1
Journal article

Schottky contacts to In2O3

  • 1. Universität Leipzig, Fakultät für Physik und Geowissenschaften, Institut für Experimentelle Physik II, Linnéstrasse 5, 04103 Leipzig (Germany)
  • 2. Materials Department, University of California, Santa Barbara, California 93106 (United States)
  • 3. Paul Drude Institut für Festkörperelektronik, Hausvogteiplatz 5-7, 10117 Berlin (Germany)

Description

n-type binary compound semiconductors such as InN, InAs, or In2O3 are especial because the branch-point energy or charge neutrality level lies within the conduction band. Their tendency to form a surface electron accumulation layer prevents the formation of rectifying Schottky contacts. Utilizing a reactive sputtering process in an oxygen-containing atmosphere, we demonstrate Schottky barrier diodes on indium oxide thin films with rectifying properties being sufficient for space charge layer spectroscopy. Conventional non-reactive sputtering resulted in ohmic contacts. We compare the rectification of Pt, Pd, and Au Schottky contacts on In2O3 and discuss temperature-dependent current-voltage characteristics of Pt/In2O3 in detail. The results substantiate the picture of oxygen vacancies being the source of electrons accumulating at the surface, however, the position of the charge neutrality level and/or the prediction of Schottky barrier heights from it are questioned

Additional details

Identifiers

Publishing Information

Journal Title
APL Materials
Journal Volume
2
Journal Issue
4
Journal Page Range
p. 046104-046104.7
ISSN
2166-532X
CODEN
AMPADS

Optional Information

Notes
(c) 2014 Author(s)