Published August 2010
| Version v1
Miscellaneous
First modification of silicon wafer resistivity distribution by the Selective Neutron Transmutation Doping
- 1. Heavy Ion Laboratory, University of Warsaw, Warsaw (Poland)
Description
no abstract available
Additional details
Identifiers
Publishing Information
- Imprint Place
- Warsaw (Poland)
- Imprint Title
- Annual Report 2009
- Imprint Pagination
- 86 p.
- Journal Page Range
- p. 59-61
- ISSN
- 1895-6726
INIS
- Country of Publication
- Poland
- Country of Input or Organization
- Poland
- INIS RN
- 41096217
- Subject category
- S46: INSTRUMENTATION RELATED TO NUCLEAR SCIENCE AND TECHNOLOGY;
- Resource subtype / Literary indicator
- No Abstract, Progress Report, Non-conventional Literature
- Descriptors DEI
- CAPTURE; CRYSTAL DOPING; ELECTRIC CONDUCTIVITY; NEUTRON BEAMS; NEUTRON REACTIONS; PROGRESS REPORT; SI SEMICONDUCTOR DETECTORS; SILICON
- Descriptors DEC
- BARYON REACTIONS; BEAMS; DOCUMENT TYPES; ELECTRICAL PROPERTIES; ELEMENTS; HADRON REACTIONS; MEASURING INSTRUMENTS; NUCLEAR REACTIONS; NUCLEON BEAMS; NUCLEON REACTIONS; PARTICLE BEAMS; PHYSICAL PROPERTIES; RADIATION DETECTORS; SEMICONDUCTOR DETECTORS; SEMIMETALS
Optional Information
- Notes
- 4 refs., 2 figs.