Diagnostic of plasma generated by magnetron sputtering and study of its effects on properties of deposited thin films (Structural and chemical

Chromium films on silicon Si(100) substrate are prepared using DC Magnetron Sputtering technique at the argon gas pressure of 3 Torr for different applied powers 40 - 140 W. The chemical composition, the thicknesses and the structural characterization for the deposited Cr films are studied and analyzed using Energy Dispersive X-Ray spectroscopy (EDX), Scanning Electron Microscopy (SEM), and X-Ray Diffraction (XRD), respectively. Furthermore, the generated plasma parameters (floating potential, plasma potential, electron density, ion density, electron temperature) have been measured, for the first time, using the automated Langmuir Probe for the Cr films deposition. The ion and metal fluxes are also determined. The results show that the Cr film thickness enhances with the higher applied powers. The Cr deposited films properties are characterized and correlated with the measured plasma parameters. (author)