Published August 1992
| Version v1
Journal article
Preparation and sputtering effects in amorphous FexZr100-x
Creators
- 1. Inst. fuer Physik, Univ. Basel (Switzerland)
Description
Amorphous FeXZr100-X films have been prepared in-situ by means of electron beam evaporation. Whereas ex-situ methods like melt-spinning and splat-cooling are restricted to very narrow concentration ranges, co-evaporation of the pure components allows the synthesis of alloys over an extended concentration range. Most importantly, sputter cleaning of the sample surface can be avoided, which may cause significant changes in the electronic structure as seen by photoemission. (orig.)
Additional details
Additional titles
- Augmented title (English)
- Fe-Zr
Publishing Information
- Journal Title
- Helvetica Physica Acta
- Journal Volume
- 65
- Journal Issue
- 6
- Journal Page Range
- p. 852-853.
- ISSN
- 0018-0238
- CODEN
- HPACAK
Conference
- Title
- Spring meeting of the Swiss Physical Society (SPS).
- Original Conference Title
- Reunion de Printemps de la Societe Suisse de Physique (SSP)
- Dates
- 6-8 Apr 1992.
- Place
- Neuchatel (Switzerland).
INIS
- Country of Publication
- Switzerland
- Country of Input or Organization
- Switzerland
- INIS RN
- 24035316
- Subject category
- S36: MATERIALS SCIENCE; S36: MATERIALS SCIENCE;
- Resource subtype / Literary indicator
- Conference
- Descriptors DEI
- AMORPHOUS STATE; DEPOSITION; ELECTRON BEAMS; ELECTRONIC STRUCTURE; EVAPORATION; FILMS; IRON ALLOYS; METALLIC GLASSES; PHOTOEMISSION; QUANTITY RATIO; SPUTTERING; SURFACES; ZIRCONIUM ALLOYS
- Descriptors DEC
- ALLOYS; BEAMS; EMISSION; LEPTON BEAMS; PARTICLE BEAMS; PHASE TRANSFORMATIONS; SECONDARY EMISSION