Published August 1994
| Version v1
Journal article
Application of high-resolution film for lithography to synchrotron X-ray topography
- 1. Shimane Univ., Matsue (Japan). Dept. of Physics
Description
A high-resolution film for lithography is applied to a detector for synchrotron radiation topography, instead of a nuclear plate. The film shows much better resolution than that of the plate although exposure time an about 500 times longer is required. The size distribution of interstitial loops grown as vacancy sources in a nearly perfect aluminum crystal after a temperature rise is examined from the while beam topograph. (author)
Additional details
Publishing Information
- Journal Title
- Japanese Journal of Applied Physics. Part 1, Regular Papers and Short Notes
- Journal Volume
- 33
- Journal Issue
- 8
- Journal Page Range
- p. 4793-4794.
- ISSN
- 0021-4922
- CODEN
- JAPNDE
INIS
- Country of Publication
- Japan
- Country of Input or Organization
- Japan
- INIS RN
- 27002563
- Subject category
- S46: INSTRUMENTATION RELATED TO NUCLEAR SCIENCE AND TECHNOLOGY;
- Descriptors DEI
- ALUMINIUM; CRYSTAL LATTICES; CRYSTALS; DEFECTS; FILMS; KEK PHOTON FACTORY; NUCLEAR EMULSIONS; RADIATION DETECTORS; SIZE; SPATIAL RESOLUTION; SYNCHROTRON RADIATION; TOPOGRAPHY
- Descriptors DEC
- BREMSSTRAHLUNG; CRYSTAL STRUCTURE; ELECTROMAGNETIC RADIATION; ELEMENTS; MEASURING INSTRUMENTS; METALS; RADIATION SOURCES; RADIATIONS; RESOLUTION; SYNCHROTRON RADIATION SOURCES