In-situ coating of titanium carbide

A parametric survey for TiC coating by reactive evaporation method to find optimum coating condition have been made in Ti + C2H2 or C2H4 systems. The parameters studied were Ti deposition rate, C2H2,C2H4 gas pressure and molybdenum substrate temperature. In this case, TiC coating films were made from Ti evaporation in C2H2 and C2H4 atmosphere. The experimental results indicated that the stoichiometric TiC films were formed on the molybdenum substrate surface. A typical condition for the stoichiometric TiC formation is Psub(C2H2) = 6 x 10-3Pa and Ti deposition rate = 1.5 A sec.-1 at Mo substrate temperature 3000C. These experimental results are suitable for applying this method to TiC in-situ coating in JT-60. (author)