Published 1989
| Version v1
Book
Multi-ampere negative ion source
Description
In order to produce multi-ampere negative ion beams for fusion applications, a large negative ion source was manufactured and tested. A 3.4 A H- ion beam was produced at an acceleration voltage of 75 kV with 253 apertures of 11.3 mm diameter. (author)
Additional details
Additional titles
- Original title (no language)
- Dai-12-kai ion kogaku shinpojiumu, iongen to ion wo kiso toshita oyo gijutsu.
Publishing Information
- Publisher
- Kyoto Univ., Research Group of Ion Engineering in Ion Beam Engineering Experimental Lab.
- Imprint Place
- Kyoto (Japan)
- Imprint Title
- Proceedings of the twelfth symposium on ion sources and ion-assisted technology
- Imprint Pagination
- 665 p.
- Journal Page Range
- p. 17-22.
Conference
- Title
- 12. symposium on ion sources and ion-assisted technology.
- Dates
- 5-7 Jun 1989.
- Place
- Tokyo (Japan).
INIS
- Country of Publication
- Japan
- Country of Input or Organization
- Japan
- INIS RN
- 21051133
- Subject category
- S70: PLASMA PHYSICS AND FUSION TECHNOLOGY;
- Resource subtype / Literary indicator
- Conference
- Descriptors DEI
- BEAM INJECTION HEATING; ELECTRIC ARCS; HYDROGEN; HYDROGEN IONS 1 MINUS; ION SOURCES; MAGNETIC FIELDS; NEUTRAL ATOM BEAM INJECTION; PLASMA; THERMONUCLEAR REACTORS
- Descriptors DEC
- ANIONS; BEAM INJECTION; CHARGED PARTICLES; CURRENTS; ELECTRIC CURRENTS; ELECTRIC DISCHARGES; ELEMENTS; HEATING; HYDROGEN IONS; IONS; NONMETALS; PLASMA HEATING
Optional Information
- Notes
- Imprint:Dai-12-kai ion kogaku shinpojiumu, iongen to ion wo kiso toshita oyo gijutsu.