Calculation of electronic and optical properties of 1550 nm VCSEL based on Group IV elements
- 1. Tianjin Key Laboratory of Optoelectronic Detection Technology and Systems, School of Electronics and Information Engineering, Tiangong University, Tianjin 300387 (China)
- 2. MIND, Departament of Electronics and Biomedical Engineering, Universitat de Barcelona (UB), Barcelona E-08028 (Spain)
Description
Si/SiGe quantum well (QW) structures show considerable potential in revolutionising Si photonics. This study proposes a novel 1550 nm vertical cavity surface-emitting laser (VCSEL) that is based on Group IV elements and composed of Si/SiO2 distributed Bragg reflectors and Si/Si0.13Ge0.87 QWs. Material composition and QW width in the active region are optimised. The proposed Group IV-based VCSEL can exhibit epitaxial growth on a vertical binary blazed grating coupler and increase coupling efficiency relative to the traditional Group III–V-based VCSEL with an Si waveguide. The proposed VCSEL on Si based on the Group IV element scheme is a cheap, high-yielding and temperature-insensitive on-chip light source that can be used in large-scale, high-density monolithic integration. (paper)
Availability note (English)
Available from http://dx.doi.org/10.1088/1555-6611/abd8ccAdditional details
Identifiers
Publishing Information
- Journal Title
- Laser Physics (Online)
- Journal Volume
- 31
- Journal Issue
- 2
- Journal Page Range
- [6 p.]
- ISSN
- 1555-6611
INIS
- Country of Publication
- Russian Federation
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 53092061
- Subject category
- S71: CLASSICAL AND QUANTUM MECHANICS, GENERAL PHYSICS;
- Descriptors DEI
- COUPLING; DENSITY; EFFICIENCY; EPITAXY; GRATINGS; LASERS; OPTICAL PROPERTIES; POTENTIALS; QUANTUM WELLS; SILICA; SILICON OXIDES; SURFACES; VISIBLE RADIATION; WAVEGUIDES
- Descriptors DEC
- CHALCOGENIDES; CRYSTAL GROWTH METHODS; ELECTROMAGNETIC RADIATION; MINERALS; NANOSTRUCTURES; OXIDE MINERALS; OXIDES; OXYGEN COMPOUNDS; PHYSICAL PROPERTIES; RADIATIONS; SILICON COMPOUNDS