Published February 2010 | Version v1
Journal article

AES Studies of Saturation in Surfactant Segregation Process in Co/Cu Multilayers

  • 1. The H. Niewodniczanski Institute of Nuclear Physics, Polish Academy of Sciences, Radzikowskiego 152, 31-342 Cracow (Poland)

Description

The chemical composition of successive layers in a Co/Cu multilayered system was studied during growth with Auger electron spectroscopy. Experiments were carried out on a sample with 10 repetitions of Co(1 nm)/Cu(2 nm) evaporated at a very low deposition rate in ultrahigh vacuum. A very small amount of Bi or Pb (0.06 nm) was deposited on each Cu film in the system. The experimental data have shown that the concentration of Bi and Pb increases with the number of deposited trilayers up to coverage corresponding to 5 trilayers. At that point the concentration of the surfactant saturated. The changes in the surfactant concentrations are described with a simple model depicting the interaction of the surfactant atoms with the system and how the evolution of the segregation processes. It allows the prediction of the saturation concentration and helps to explain the behaviour of various elements used as a surfactant. The comparison between the theoretical predictions and the experimental results is also discussed. (author)

Availability note (English)

Also available at http://przyrbwn.icm.edu.pl/APP/PDF/117/a117z263.pdf

Additional details

Additional titles

Augmented title (English)
PACS numbers: 82.80.Pv, 68.55.-a, 68.65.Ac

Publishing Information

Journal Title
Acta Physica Polonica. Series A (Online)
Journal Volume
117
Journal Issue
2
Journal Page Range
p. 420-422
ISSN
1898-794X

Conference

Title
Submicron Structures in Physics and Biology
Acronym
44 Zakopane School of Physics International Symposium Breaking Frontiers
Dates
18-23 May 2009
Place
Zakopane (Poland)

INIS

Country of Publication
Poland
Country of Input or Organization
Poland
INIS RN
42099455
Subject category
S36: MATERIALS SCIENCE;
Resource subtype / Literary indicator
Conference
Descriptors DEI
AUGER ELECTRON SPECTROSCOPY; BISMUTH ADDITIONS; CHEMICAL COMPOSITION; COBALT; COPPER; LAYERS; LEAD ADDITIONS; PRESSURE RANGE NANO PA; SURFACTANTS
Descriptors DEC
ALLOYS; BISMUTH ALLOYS; ELECTRON SPECTROSCOPY; ELEMENTS; LEAD ALLOYS; METALS; PRESSURE RANGE; SPECTROSCOPY; TRANSITION ELEMENTS

Optional Information

Notes
8 refs., 2 figs.