Low temperature synthesis of ITO thin film on polymer in Ar/H2 plasma by pulsed DC magnetron sputtering
Creators
- 1. Center for Advanced Plasma Surface Technology, Sungkyunkwan University, 300 Cheoncheon-dong, Jangan-gu, Suwon, 400-746 (Korea, Republic of)
Description
Indium tin oxide (ITO) films were synthesized on polymer (PES, polyethersulfone) at low temperature less than 100 oC by pulsed DC magnetron sputtering. The microstructure evolution of ITO thin film was investigated by employing the hydrogen gas in Ar discharge. The discharge behavior with hydrogen gas addition was analyzed by optical emission spectroscopy (OES) and microstructure change was investigated by XRD and TEM. It could be confirmed that the discharge with a mixture gas of hydrogen and Ar made an effect on the ionization of indium and oxygen gases as measured by OES and also significantly promoted the formation of crystallites of ITO in amorphous matrix. As a result, the resistivity of ITO film was significantly improved to 5.27 x 10-4 Ω.cm at 0.026 Pa of hydrogen partial pressure below 100 deg. C in comparison with 2.65 x 10-3 Ω.cm under hydrogen free condition
Availability note (English)
Available from http://dx.doi.org/10.1016/j.tsf.2007.11.028Additional details
Identifiers
- DOI
- 10.1016/j.tsf.2007.11.028;
- PII
- S0040-6090(07)01886-X;
Publishing Information
- Journal Title
- Thin Solid Films
- Journal Volume
- 516
- Journal Issue
- 19
- Journal Page Range
- p. 6560-6564
- ISSN
- 0040-6090
- CODEN
- THSFAP
Conference
- Title
- 20. symposium on plasma science for materials
- Acronym
- SPSM-20
- Dates
- 21-22 Jun 2007
- Place
- Nagoya (Japan)
INIS
- Country of Publication
- Netherlands
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 40005910
- Subject category
- S36: MATERIALS SCIENCE;
- Resource subtype / Literary indicator
- Conference
- Descriptors DEI
- ARGON; EMISSION SPECTROSCOPY; HYDROGEN; INDIUM; INDIUM OXIDES; IONIZATION; MAGNETRONS; MICROSTRUCTURE; PARTIAL PRESSURE; PLASMA; POLYMERS; SPUTTERING; SYNTHESIS; TEMPERATURE RANGE 0273-0400 K; THIN FILMS; TIN OXIDES; TRANSMISSION ELECTRON MICROSCOPY; X-RAY DIFFRACTION
- Descriptors DEC
- CHALCOGENIDES; COHERENT SCATTERING; DIFFRACTION; ELECTRON MICROSCOPY; ELECTRON TUBES; ELECTRONIC EQUIPMENT; ELEMENTS; EQUIPMENT; FILMS; FLUIDS; GASES; INDIUM COMPOUNDS; METALS; MICROSCOPY; MICROWAVE EQUIPMENT; MICROWAVE TUBES; NONMETALS; OXIDES; OXYGEN COMPOUNDS; PHYSICAL PROPERTIES; RARE GASES; SCATTERING; SPECTROSCOPY; TEMPERATURE RANGE; THERMODYNAMIC PROPERTIES; TIN COMPOUNDS
Optional Information
- Copyright
- Copyright (c) 2007 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.