Published October 1, 2017 | Version v1
Journal article

Evolution of the structural and electronic properties of thin Bi films on Ge(111)

  • 1. LNESS-Dipartimento di Fisica, Politecnico di Milano, Piazza Leonardo da Vinci 32, 20133 Milano (Italy)

Description

We have incrementally grown bismuth thin films onto a n-doped Ge(111) substrate. Low energy electron diffraction reveals that the first Bi atomic layer is characterized by the ( 3 × 3 ) R 30 reconstruction. By angle-resolved photoemission spectroscopy we observe Rashba-split bands that do not cross the Fermi level. At higher coverages, where a Rashba type of splitting should still be present, the density of occupied states close to the Fermi energy gradually increases, while extra diffraction spots, related to Bi(110) islands, appear. (paper)

Availability note (English)

Available from http://dx.doi.org/10.1088/1742-6596/903/1/012024

Additional details

Publishing Information

Journal Title
Journal of Physics. Conference Series (Online)
Journal Volume
903
Journal Issue
1
Journal Page Range
[4 p.]
ISSN
1742-6596

INIS

Country of Publication
United Kingdom
Country of Input or Organization
International Atomic Energy Agency (IAEA)
INIS RN
51029482
Subject category
S36: MATERIALS SCIENCE;
Descriptors DEI
BISMUTH; DOPED MATERIALS; ELECTRON DIFFRACTION; FERMI LEVEL; LAYERS; PHOTOELECTRON SPECTROSCOPY; SUBSTRATES; THIN FILMS
Descriptors DEC
COHERENT SCATTERING; DIFFRACTION; ELECTRON SPECTROSCOPY; ELEMENTS; ENERGY LEVELS; FILMS; MATERIALS; METALS; SCATTERING; SPECTROSCOPY