Published March 1985 | Version v1
Journal article

Dezincification of boron implanted brass

  • 1. Helsinki Univ. of Technology, Espoo (Finland). Lab. of Physical Metallurgy
  • 2. Helsinki Univ. (Finland). Dept. of Physics

Description

Dezincification tests, transmission electron microscopy and γ-yields of the reactions 10B(p, αγ)7Be, 10B(α, pγ)13C and 11B(p, γ)12C obtained by using a 2.5 MV Van de Graaff accelerator were employed in corrosion, structure and composition analyses in improving the dezincification resistance of brass with additions of boron. The macrosegregation analyses revealed that the poor dezincification resistant as-cast brasses, which have large additions of boron, also have a large accumulation of boron near the centerline, whereas boron implantation with 5 at.% maximum boron concentration is able for a short time to give such effectively improved dezincification resistance, which in the case of low boron alloyed brasses has been attributed to the trapping of vacancies with boron atoms. (orig.)

Additional details

Publishing Information

Journal Title
Nucl. Instrum. Methods Phys. Res., Sect. B
Journal Volume
7/8
Journal Issue
pt.1
Series
CODEN: NIMBE.;Nucl. Instrum. Methods Phys. Res., Sect. B.
Journal Page Range
200-204
ISSN
0168-583X

Conference

Title
Ion beam modification of materials conference (IBMM '84).
Dates
16-29 Jul 1984.
Place
Ithaca, NY (USA).

INIS

Country of Publication
Netherlands
Country of Input or Organization
Netherlands
INIS RN
16067243
Subject category
S36: MATERIALS SCIENCE;
Resource subtype / Literary indicator
Conference
Descriptors DEI
BORON ADDITIONS; BRASS; CORROSION RESISTANCE; ELECTRON DIFFRACTION; ION IMPLANTATION; MICROSTRUCTURE; PHYSICAL RADIATION EFFECTS; QUANTITY RATIO; TRANSMISSION ELECTRON MICROSCO
Descriptors DEC
ALLOYS; COHERENT SCATTERING; COPPER ALLOYS; COPPER BASE ALLOYS; CRYSTAL STRUCTURE; DIFFRACTION; ELECTRON MICROSCOPY; MICROSCOPY; RADIATION EFFECTS; SCATTERING; ZINC ALLOYS