Published August 2009 | Version v1
Journal article

Chemical etching of a GaSb crystal incorporated with Mn grown by the Bridgman method under microgravity conditions

  • 1. Key Laboratory of Semiconductor Materials and Devices, Institute of Semiconductors, Chinese Academy of Sciences, Beijing 100083 (China)

Description

A GaSb crystal incorporated with Mn has been grown by the Bridgman method on the Polizon facility onboard the FOTON-M3 spacecraft. Structural defects and growth striations have been successfully revealed by the chemical etching method. By calculating various parameters of the convection, the striation patterns can be explained, and the critical value of the Taylor number, which characterizes the convective condition of the rotating magnetic field induced azimuthal flow, was shown. The stresses generated during crystal growth can be reflected by the observations of etch pit distribution and other structural defects. Suggestions for improving the space experiment to improve the quality of the crystal are given. (semiconductor materials)

Availability note (English)

Available from http://dx.doi.org/10.1088/1674-4926/30/8/083006

Additional details

Publishing Information

Journal Title
Journal of Semiconductors
Journal Volume
30
Journal Issue
8
Journal Page Range
[5 p.]
ISSN
1674-4926

INIS

Country of Publication
United Kingdom
Country of Input or Organization
International Atomic Energy Agency (IAEA)
INIS RN
42068469
Subject category
S36: MATERIALS SCIENCE;
Descriptors DEI
BRIDGMAN METHOD; CRYSTAL GROWTH; CRYSTALS; DEFECTS; ETCHING; GALLIUM ANTIMONIDES; MANGANESE; SPACE VEHICLES; STRESSES; STRIATIONS
Descriptors DEC
ANTIMONIDES; ANTIMONY COMPOUNDS; CRYSTAL GROWTH METHODS; ELEMENTS; GALLIUM COMPOUNDS; METALS; PNICTIDES; SURFACE FINISHING; TRANSITION ELEMENTS; VEHICLES