Published April 16, 1986 | Version v1
Journal article

Role of defects in the annealing behaviour of RF sputtered CdS films

  • 1. Universidad Complutense de Madrid (Spain). Dept. de Electricidad y Electronica
  • 2. Universidad Complutense de Madrid (Spain). Facultad de Ciencias Fisicas

Description

The defect structure of CdS thin films grown by RF sputtering is studied by electrical and positron annihilation measurements after different thermal treatments. It is shown that for annealing temperatures below 475 K desorbed impurities (probably oxygen) cause an increase in both, the carrier mobility and concentration. For annealing temperatures above 475 K, positron annihilation measurements reveal a S-vacancy agglomeration in agreement with the electrical measurements. (author)

Additional details

Publishing Information

Journal Title
Phys. Status Solidi A
Journal Volume
94
Journal Issue
2
Series
Phys. Status Solidi A.
Journal Page Range
587-593
ISSN
0031-8965
CODEN
PSSAB