CCTO thin film synthesis by radio frequency magnetron sputtering

In the present work CCTO thin film has successfully deposited on FTO substrate in a non-reactive (argon) atmosphere with frequency (RF) magnetron sputtering at 300 W. This work aims to determine the structural, morphological and optical properties of thin film using X-ray diffraction (XRD), atomic force microscopy (AFM) and Ultraviolet–visible spectroscopy (UV-Vis), respectively. The result shows that the nature of CCTO thin film is polycrystalline with cubic structure. XRD peaks confirmed the presence of CCTO phase with the crystal planes of (022), (013), (033), (024), and (224). The average crystallite size was 32 nm as measured by Willamson-Hall method. The surface roughness (Ra) and root mean square (RMS) of CCTO thin film were 26 nm and 33 nm, respectively. The maximum optical transmittance of CCTO thin film was more than 80% in the visible region (550-1000 nm) while calculated optical energy bandgaps was 3.2 eV. (paper)