Published August 18, 1983
| Version v1
Journal article
Subthreshold currents in CMOS transistors made on oxygen-implanted silicon
Description
Kinks have been observed in subthreshold current plots of mesa-shaped n-channel transistors made on oxygen-implanted silicon substrates. The kinks represent additional current flow and are due to overlapping fields from the gate electrode causing early corner inversion and to a Qsub(ss) side-wall effect. Subthreshold currents in n-channel transistors are dominated by the two effects which, as a consequence, reduce threshold voltages especially in narrow n-channel transistors. The subthreshold characteristics of p-channel transistors were not affected in the same way. (author)
Additional details
Publishing Information
- Journal Title
- Electron. Lett.
- Journal Volume
- 19
- Journal Issue
- 17
- Series
- Electron. Lett.
- Journal Page Range
- 684-685
- ISSN
- 0013-5194
INIS
- Country of Publication
- United Kingdom
- Country of Input or Organization
- United Kingdom
- INIS RN
- 15007640
- Subject category
- S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY;
- Descriptors DEI
- ELECTRIC CURRENTS; ELECTRIC FIELDS; ELECTRIC POTENTIAL; ELECTRODES; ION IMPLANTATION; MOS TRANSISTORS; OXYGEN IONS; SILICON; SUBSTRATES
- Descriptors DEC
- CHARGED PARTICLES; CURRENTS; ELEMENTS; IONS; SEMICONDUCTOR DEVICES; SEMIMETALS; TRANSISTORS