Published July 13, 2015
| Version v1
Journal article
Electrical dependence on the chemical composition of the gate dielectric in indium gallium zinc oxide thin-film transistors
- 1. Department of Electrical and Computer Engineering, University of Waterloo, 200 University Avenue West, Waterloo, Ontario N2L 3G1 (Canada)
Description
Bottom-gate thin-film transistors were fabricated by depositing a 50 nm InGaZnO (IGZO) channel layer at 150 °C on three separate gate dielectric films: (1) thermal SiO2, (2) plasma-enhanced chemical-vapor deposition (PECVD) SiNx, and (3) a PECVD SiOx/SiNx dual-dielectric. X-ray photoelectron and photoluminescence spectroscopy showed the Vo concentration was dependent on the hydrogen concentration of the underlying dielectric film. IGZO films on SiNx (high Vo) and SiO2 (low Vo) had the highest and lowest conductivity, respectively. A PECVD SiOx/SiNx dual-dielectric layer was effective in suppressing hydrogen diffusion from the nitride layer into the IGZO and resulted in higher resistivity films
Additional details
Identifiers
- DOI
- 10.1063/1.4926495;
Publishing Information
- Journal Title
- Applied Physics Letters
- Journal Volume
- 107
- Journal Issue
- 2
- Journal Page Range
- p. 023501-023501.4
- ISSN
- 0003-6951
- CODEN
- APPLAB
INIS
- Country of Publication
- United States
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 47053183
- Subject category
- S71: CLASSICAL AND QUANTUM MECHANICS, GENERAL PHYSICS;
- Descriptors DEI
- ABUNDANCE; CHEMICAL COMPOSITION; CHEMICAL VAPOR DEPOSITION; DEPOSITS; DIELECTRIC MATERIALS; DIFFUSION; GALLIUM; HYDROGEN; INDIUM; LAYERS; PHOTOLUMINESCENCE; PLASMA; SILICON OXIDES; SPECTROSCOPY; THIN FILMS; TRANSISTORS; X RADIATION; ZINC OXIDES
- Descriptors DEC
- CHALCOGENIDES; CHEMICAL COATING; DEPOSITION; ELECTROMAGNETIC RADIATION; ELEMENTS; EMISSION; FILMS; IONIZING RADIATIONS; LUMINESCENCE; MATERIALS; METALS; NONMETALS; OXIDES; OXYGEN COMPOUNDS; PHOTON EMISSION; RADIATIONS; SEMICONDUCTOR DEVICES; SILICON COMPOUNDS; SURFACE COATING; ZINC COMPOUNDS
Optional Information
- Notes
- (c) 2015 AIP Publishing LLC