Published April 2014
| Version v1
Journal article
Control of ions energy distribution in dual-frequency magnetron sputtering discharges
- 1. School of Physics Science and Technology, Jiangsu Key Laboratory of Thin Films, Soochow University, Suzhou 215006 (China)
- 2. Medical College of Soochow University, Suzhou 215123 (China)
Description
The ion energy distributions (IEDs) in the dual-frequency magnetron sputtering discharges were investigated by retarding field energy analyzer. Increasing power ratio of 2 MHz to 13.56 (27.12 or 60) MHz led to the evolution of IEDs from a uni-modal distribution towards a uni-modal distribution with high-energy peak shoulder and a bi-modal distribution. While increasing power ratio of 13.56 MHz to 27.12 MHz and 27.12 MHz to 60 MHz, led to the increase of peak energy. The evolution of IEDs shape and the increase of peak energy are due to the change of ions responding to the average field of high-frequency period towards the instantaneous sheath potential of low-frequency period
Additional details
Identifiers
- DOI
- 10.1063/1.4873401;
Publishing Information
- Journal Title
- Physics of Plasmas
- Journal Volume
- 21
- Journal Issue
- 4
- Journal Page Range
- p. 043509-043509.9
- ISSN
- 1070-664X
- CODEN
- PHPAEN
INIS
- Country of Publication
- United States
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 45074266
- Subject category
- S46: INSTRUMENTATION RELATED TO NUCLEAR SCIENCE AND TECHNOLOGY; S70: PLASMA PHYSICS AND FUSION TECHNOLOGY;
- Descriptors DEI
- DISTRIBUTION; ENERGY SPECTRA; MAGNETRONS; MHZ RANGE 01-100; PEAKS
- Descriptors DEC
- ELECTRON TUBES; ELECTRONIC EQUIPMENT; EQUIPMENT; FREQUENCY RANGE; MHZ RANGE; MICROWAVE EQUIPMENT; MICROWAVE TUBES; SPECTRA
Optional Information
- Notes
- (c) 2014 AIP Publishing LLC