Published 1988 | Version v1
Book

Laser-assisted deposition of Fe and W

  • 1. Harvard Univ., Cambridge, MA (USA). Dept. of Chemistry

Description

The laser-assisted chemical vapor deposition (LCVD) of Fe and W on Si (111)-(7-barx7) was investigated under ultrahigh vacuum conditions at 120 K. Multiple internal reflection Fourier transform infrared and Auger electron spectroscopies and temperature programmed desorption and low energy electron diffraction were used to study the adsorption and decomposition of Fe(CO)5 and W(CO)6 on the surface. Neither of the molecules thermally reacts in temperature programmed desorption experiments. Reversible molecular desorption is exclusively observed. Decomposition of both molecules via electronic excitation was induced by ultraviolet, but not visible photons. This was shown by measuring the photodecomposition yield as a function of wavelength. Visible photolysis (λ=720 nm) had no observable effect on either molecule. No surface stable, partially decarbonylated, Fe(CO)x, x<5, fragments observable with infrared spectroscopy were produced by photolysis. Also, no new features were observed in temperature programmed desorption experiments and only iron was detected on the surface after photolysis. In contrast, initial results indicate that photolysis of W(CO)6 does produce surface stable, W(CO)x, x<6, fragments

Additional details

Additional titles

Subtitle (English)
Photodecomposition of Fe(CO)_5 and W(CO)_6 on Si(111)-(7x7)"a

Publishing Information

Publisher
Materials Research Society.
Imprint Place
Pittsburgh, PA (USA)
ISBN
0-931837-69-3
Imprint Title
Laser and particle-beam chemical processing for microelectronics
Imprint Pagination
509 p.
Series
Materials Research Society symposium proceedings. Volume 101.
Journal Page Range
p. 201-206.

Conference

Title
Laser and particle-beam chemical processing for microelectronics.
Dates
30 Nov - 3 Dec 1987.
Place
Boston, MA (USA).

Optional Information

Secondary number(s)
CONF-8711147--.