Published August 2011 | Version v1
Journal article

Interfacial and rectifying characteristic of epitaxial SrTiO3-δ/GaAs p-n junctions

  • 1. School of Materials Science and Engineering, Southwest University of Science and Technology, Mianyang 621010 (China)
  • 2. Department of Applied Physics and Materials Research Centre, The Hong Kong Polytechnic University, Hong Kong (China)
  • 3. State Key Laboratory of Electronic Thin Films and Integrated Devices, University of Electronics Science and Technology of China, Chengdu 610054 (China)

Description

Oxygen-deficient SrTiO3-δ thin films were grown on p-GaAs substrates to form p-n heterojunctions. The interfacial and transport characteristics of the heterojunctions have been investigated. The sharp interface was found to be epitaxially crystallized. The junctions present good rectifying behaviors and thickness dependence of current-voltage properties. The electronic transport of 200 nm thick SrTiO3-δ/GaAs could be explained by a space charge limited model. When the thickness was reduced further, the diode ideality factors were almost temperature independent, which might be attributed to a strain-assisted tunneling mechanism.

Availability note (English)

Available from http://dx.doi.org/10.1016/j.scriptamat.2011.04.035

Additional details

Identifiers

DOI
10.1016/j.scriptamat.2011.04.035;
PII
S1359-6462(11)00237-5;

Publishing Information

Journal Title
Scripta Materialia
Journal Volume
65
Journal Issue
4
Journal Page Range
p. 323-326
ISSN
1359-6462
CODEN
SCMAF7

Optional Information

Copyright
Copyright (c) 2011 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.