Catalytically-etched hexagonal boron nitride flakes and their surface activity
Creators
- 1. School of Electrical Engineering, Korea University, 5-ga, Anam-dong, Seongbuk-gu, Seoul 136-713 (Korea, Republic of)
- 2. Green Manufacturing 3Rs R&D Group, Korea Institute of Industrial Technology, Ulsan 681-310 (Korea, Republic of)
- 3. New Functional Components Research Team, Korea Institute of Footware & Leather Technology, 152 Danggamseo-ro, Busanjin-gu, Busan 614-100 (Korea, Republic of)
Description
Highlights: • Hexagonal boron nitride flakes are etched at low temperature in air by catalysts. • The presence of transition metal oxides produces an etched structure in the flakes. • Etched surfaces become highly active due to vacancy defects formed in the flakes. - Abstract: Hexagonal boron nitride (h-BN) is a ceramic compound which is thermally stable up to 1000 °C in air. Due to this, it is a very challenging task to etch h-BN under air atmosphere at low temperature. In this study, we report that h-BN flakes can be easily etched by oxidation at 350 °C under air atmosphere in the presence of transition metal (TM) oxide. After selecting Co, Cu, and Zn elements as TM precursors, we simply oxidized h-BN sheets impregnated with the TM precursors at 350 °C in air. As a result, microscopic analysis revealed that an etched structure was created on the surface of h-BN flakes regardless of catalyst type. And, X-ray diffraction patterns indicated that the air oxidation led to the formation of Co3O4, CuO, and ZnO from each precursor. Thermogravimetric analysis showed a gradual weight loss in the temperature range where the weight of h-BN flakes increased by air oxidation. As a result of etching, pore volume and pore area of h-BN flakes were increased after catalytic oxidation in all cases. In addition, the surface of h-BN flakes became highly active when the h-BN samples were etched by Co3O4 and CuO catalysts. Based on these results, we report that h-BN flakes can be easily oxidized in the presence of a catalyst, resulting in an etched structure in the layered structure.
Availability note (English)
Available from http://dx.doi.org/10.1016/j.apsusc.2017.01.066Additional details
Identifiers
- DOI
- 10.1016/j.apsusc.2017.01.066;
- PII
- S0169-4332(17)30066-1;
Publishing Information
- Journal Title
- Applied Surface Science
- Journal Volume
- 402
- Journal Page Range
- p. 254-260
- ISSN
- 0169-4332
- CODEN
- ASUSEE
INIS
- Country of Publication
- Netherlands
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 48077888
- Subject category
- S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY;
- Descriptors DEI
- BORON NITRIDES; CATALYSTS; CERAMICS; COBALT OXIDES; COPPER OXIDES; DEFECTS; ETCHING; HEXAGONAL LATTICES; OXIDATION; SHEETS; SURFACES; THERMAL GRAVIMETRIC ANALYSIS; TRANSITION ELEMENTS; VACANCIES; X-RAY DIFFRACTION; ZINC OXIDES
- Descriptors DEC
- BORON COMPOUNDS; CHALCOGENIDES; CHEMICAL ANALYSIS; CHEMICAL REACTIONS; COBALT COMPOUNDS; COHERENT SCATTERING; COPPER COMPOUNDS; CRYSTAL DEFECTS; CRYSTAL LATTICES; CRYSTAL STRUCTURE; DIFFRACTION; ELEMENTS; GRAVIMETRIC ANALYSIS; METALS; NITRIDES; NITROGEN COMPOUNDS; OXIDES; OXYGEN COMPOUNDS; PNICTIDES; POINT DEFECTS; QUANTITATIVE CHEMICAL ANALYSIS; SCATTERING; SURFACE FINISHING; THERMAL ANALYSIS; THREE-DIMENSIONAL LATTICES; TRANSITION ELEMENT COMPOUNDS; ZINC COMPOUNDS
Optional Information
- Copyright
- Copyright (c) 2017 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.