Dielectric relaxation in insulating layers on contaminated Langmuir probes
Creators
Description
Measurements have been made of the low-frequency admittance of contaminated Langmuir probes in a mercury-vapor plasma. It was found that the probe admittance components were frequency dependent and could be represented by an equivalent electrical circuit corresponding to a metal-insulator-plasma configuration. The frequency dispersion of the admittance components is described by the empirical equation Y=G∞−(G∞−G0)/ [1+(G0/G∞) (jωτ0)1−h], where Y is the complex admittance, G0 and G∞ are the static and infinite-frequency values of conductance, τ0 is a relaxation time constant, and h is a parameter with values between 0 and 1. The complex-plane locus of the admittance is a circular arc from which the resistance of the insulating layer on the probe surface, the plasma-sheath resistance, and the value of h are derived. The susceptance-voltage characteristic of a probe is shown to be a sensitive indicator for the presence of insulating material on the probe surface. The susceptance-voltage curve for an insulator-contaminated probe has a peak in the vicinity of plasma potential which disappears upon removal of the insulating material by sputtering.
Additional details
Identifiers
- DOI
- 10.1063/1.1661595;
Publishing Information
- Journal Title
- Journal of Applied Physics
- Journal Volume
- 43
- Journal Issue
- 6
- Series
- J. Appl. Phys.
- Journal Page Range
- 2785-2789
- ISSN
- 0021-8979
INIS
- Country of Publication
- United States
- Country of Input or Organization
- United States
- INIS RN
- 4035603
- Subject category
- S70: PLASMA PHYSICS AND FUSION TECHNOLOGY;
- Descriptors DEI
- ELECTRIC CONDUCTIVITY; IMPURITIES; LANGMUIR PROBE; MERCURY; PLASMA; PLASMA DIAGNOSTICS
- Descriptors DEC
- ELECTRIC PROBES; ELECTRICAL PROPERTIES; ELEMENTS; METALS; PHYSICAL PROPERTIES; PROBES
Optional Information
- Notes
- Updated automatically by Metadata and Full-Text Enrichment Agent