Published June 1972 | Version v1
Journal article

Dielectric relaxation in insulating layers on contaminated Langmuir probes

Creators

Description

Measurements have been made of the low-frequency admittance of contaminated Langmuir probes in a mercury-vapor plasma. It was found that the probe admittance components were frequency dependent and could be represented by an equivalent electrical circuit corresponding to a metal-insulator-plasma configuration. The frequency dispersion of the admittance components is described by the empirical equation Y=G∞−(G∞−G0)/ [1+(G0/G∞) (jωτ0)1−h], where Y is the complex admittance, G0 and G∞ are the static and infinite-frequency values of conductance, τ0 is a relaxation time constant, and h is a parameter with values between 0 and 1. The complex-plane locus of the admittance is a circular arc from which the resistance of the insulating layer on the probe surface, the plasma-sheath resistance, and the value of h are derived. The susceptance-voltage characteristic of a probe is shown to be a sensitive indicator for the presence of insulating material on the probe surface. The susceptance-voltage curve for an insulator-contaminated probe has a peak in the vicinity of plasma potential which disappears upon removal of the insulating material by sputtering.

Additional details

Identifiers

Publishing Information

Journal Title
Journal of Applied Physics
Journal Volume
43
Journal Issue
6
Series
J. Appl. Phys.
Journal Page Range
2785-2789
ISSN
0021-8979

INIS

Country of Publication
United States
Country of Input or Organization
United States
INIS RN
4035603
Subject category
S70: PLASMA PHYSICS AND FUSION TECHNOLOGY;
Descriptors DEI
ELECTRIC CONDUCTIVITY; IMPURITIES; LANGMUIR PROBE; MERCURY; PLASMA; PLASMA DIAGNOSTICS
Descriptors DEC
ELECTRIC PROBES; ELECTRICAL PROPERTIES; ELEMENTS; METALS; PHYSICAL PROPERTIES; PROBES

Optional Information

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