Published December 1991
| Version v1
Journal article
A study on reaction kinetics of the radicals produced in the laser-induced silane plasma
- 1. Dept. of Physics, Hebei Univ., Baoding (China)
Description
The reaction kinetic processes of species produced in a pulsed TEA CO2 laser induced silane plasma were studied with the time-resolved OES. It is showed that the time position of main peaks for different fragments' characteristic lines are appreciably different. The reaction kinetic processes are discussed based on the results. By comparing the time evolution of the lines of the fragments and considering the other results of OES, the authors infer that the final reaction channel of the laser-induced silane plasma is a Si producing channel
Additional details
Publishing Information
- Journal Title
- Acta Physica Sinica
- Journal Volume
- 40
- Journal Issue
- 12
- Journal Page Range
- p. 2024-2031.
- ISSN
- 1000-3290
- CODEN
- WLHPAR
INIS
- Country of Publication
- China
- Country of Input or Organization
- China
- INIS RN
- 24009265
- Subject category
- S70: PLASMA PHYSICS AND FUSION TECHNOLOGY;
- Descriptors DEI
- CARBON DIOXIDE LASERS; EMISSION SPECTROSCOPY; LASER-PRODUCED PLASMA; OPTICS; RADICALS; REACTION KINETICS; SILANES
- Descriptors DEC
- AMPLIFIERS; EQUIPMENT; GAS LASERS; HYDRIDES; HYDROGEN COMPOUNDS; KINETICS; LASERS; PLASMA; SILICON COMPOUNDS; SPECTROSCOPY