Published 1991 | Version v1
Book

Presheath and current-free double layer in a two-electron-population plasma or a plasma with negative ions

  • 1. Himeji Inst. of Technology (Japan)

Description

An edge plasma close to the RF antenna, which has a nonthermal energetic electron population, and a plasma for the negative ion source have two populations of negative charged species. The development of the potential near the wall is treated for such a plasma with two populations. The plasma equation is analytically solved to show the possibility of steady-state potential formation in the plasma and to obtain the potential drop in the presheath. The potential drop in the presheath considerably depends on the relative densities of the two populations. It discontinuously changes from the value of the order of kTc/e to one of the order of kTh/e where Tc is the effective temperature of the cold population and Th is one of the hot population. This happens when the ratio of the particle density of the energetic population to one of the cold population nh/nc becomes greater than a certain value of the order of 0.1. It is also shown that a current-free double layer can be steadily formed in the plasma when the ratio nh/nc is of the order of 0.1. The double layer is formed so as to connect two presheath potentials with different values. The position and amplitude of the double layer are controlled by changing the ratio nh/nc and a spatial distribution of the particle source. 1 ref

Part of:
1991 International Sherwood fusion theory conference

Additional details

Publishing Information

Publisher
STI Optronics, Inc.
Imprint Place
Bellevue, WA (United States)
Imprint Title
1991 International Sherwood fusion theory conference
Imprint Pagination
207 p.
Journal Page Range
p. 3C10.

Conference

Title
International Sherwood fusion theory conference.
Dates
22-24 Apr 1991.
Place
Seattle, WA (United States).

INIS

Country of Publication
United States
Country of Input or Organization
United States
INIS RN
24065721
Subject category
S70: PLASMA PHYSICS AND FUSION TECHNOLOGY;
Resource subtype / Literary indicator
Conference
Descriptors DEI
ANALYTICAL SOLUTION; ANIONS; ELECTRON TEMPERATURE; PLASMA; PLASMA POTENTIAL; SPATIAL DISTRIBUTION
Descriptors DEC
CHARGED PARTICLES; DISTRIBUTION; ELECTRIC POTENTIAL; IONS

Optional Information

Secondary number(s)
CONF-910460--.