Published 1996 | Version v1
Book

The effect of nitrogen content on the properties of TiN films

  • 1. Salford Univ. (United Kingdom). Dept. of Electrical Engineering
  • 2. Rossijskaya Akademiya Nauk, Moscow (Russian Federation)

Description

Titanium nitride TiNx layers have been deposited on steel substrates by unbalanced magnetron sputtering. The film microhardness was found to have a maximum at x ∼0.9. For this value of x a maximum content of carbon, the high lattice distortion (especially for the (200) plane) and a maximum in the proportion of nitrogen with almost saturated bonds with Ti atoms was observed. (author). 5 refs., 5 figs

Part of:
Trends and new applications in thin films

Additional details

Publishing Information

Publisher
Societe Francaise du Vide.
Imprint Place
Paris (France)
Imprint Title
Trends and new applications in thin films
Imprint Pagination
298 p.
Journal Page Range
p. 209-211.

Conference

Title
5. International Symposium on Trends and New Applications in Thin Films.
Dates
1-3 Apr 1996.
Place
Colmar (France).

Optional Information