Published May 1987 | Version v1
Journal article

Microanalysis by focused MeV helium ion beam

  • 1. Osaka Univ., Toyonaka (Japan). Faculty of Engineering Science

Description

A microbeam line with 1.5 MeV helium ions for Rutherford backscattering (RBS) and particle-induced X-ray emission (PIXE) measurements has been realized by piezo-driven objective slits and a magnetic quadrupole doublet. A minimum beam spot size of 1.3 μm x 2.2 μm was obtained. Secondary electron and Rutherford backscattering mapping images were demonstrated. (author)

Additional details

Publishing Information

Journal Title
Jpn. J. Appl. Phys., Part 2
Journal Volume
26
Journal Issue
5
Series
Jpn. J. Appl. Phys., Part 2.
Journal Page Range
L550-L553
ISSN
0021-4922
CODEN
JAPLD