Published May 1987
| Version v1
Journal article
Microanalysis by focused MeV helium ion beam
Creators
- 1. Osaka Univ., Toyonaka (Japan). Faculty of Engineering Science
Description
A microbeam line with 1.5 MeV helium ions for Rutherford backscattering (RBS) and particle-induced X-ray emission (PIXE) measurements has been realized by piezo-driven objective slits and a magnetic quadrupole doublet. A minimum beam spot size of 1.3 μm x 2.2 μm was obtained. Secondary electron and Rutherford backscattering mapping images were demonstrated. (author)
Additional details
Publishing Information
- Journal Title
- Jpn. J. Appl. Phys., Part 2
- Journal Volume
- 26
- Journal Issue
- 5
- Series
- Jpn. J. Appl. Phys., Part 2.
- Journal Page Range
- L550-L553
- ISSN
- 0021-4922
- CODEN
- JAPLD
INIS
- Country of Publication
- Japan
- Country of Input or Organization
- Japan
- INIS RN
- 18096309
- Subject category
- S74: ATOMIC AND MOLECULAR PHYSICS;
- Descriptors DEI
- BACKSCATTERING; ELECTRON EMISSION; GOLD; HELIUM IONS; ION BEAMS; MICROANALYSIS; RUTHERFORD SCATTERING; SECONDARY EMISSION; X-RAY EMISSION ANALYSIS
- Descriptors DEC
- BEAMS; CHARGED PARTICLES; CHEMICAL ANALYSIS; ELASTIC SCATTERING; ELEMENTS; EMISSION; IONS; METALS; NONDESTRUCTIVE ANALYSIS; SCATTERING; TRANSITION ELEMENTS