Deposititon of Y-Ba-Cu-O thin films by RF magnetron sputtering

Thin film of YBa2Cu3O7-x (123) were deposited on MgO (100) and (100) SrTiO3 substrates using a single oxide target by RF magnetron sputtering. A severe negative ion bombardment was observed in the region above the target. In order to avoid the resputtering the substrates were mounted away from the target. The degree of orientation and the superconducting properties of the films were further improved by the application of a secondary magnetic field during sputtering. The films are deposition were highly oriented with the c-axis perpendicular to the plane of the substrate. The rocking curves for the films deposited on MgO substrate for (005) reflection had FWHM of 0.4 degrees. These films when analyzed by ion channeling using 3 MeV helium ion energy gave a minimum yield of 30%. The films after deposition had T(onset) around 88 K and T(zero) around 75 K. A quick anneal in oxygen at 900 degrees C increased the T(onset) to 91 K and T(zero) to 86 K