Published December 15, 1999
| Version v1
Journal article
Mechanical properties of Ti-Ni shape memory thin films formed by sputtering
Creators
- 1. National Research Inst. for Metals, Ibaraki (Japan)
- 2. Institute of Materials Science, University of Tsukuba, Tsukuba, Ibaraki (Japan)
Description
The stress-strain curves of Ti-48.3, 50.0, 51.5at.%Ni thin films were measured. The results showed that sputter-deposited thin films possess sufficient ductility and strength for practical use. Particularly it was noted that a Ti-48.3at.%Ni thin film annealed at 773 K for 300 s shows a large elongation of 20% contrary to bulk specimens. However, the ductility of Ti-48.3at.%Ni thin films was found to be very sensitive to annealing conditions. Ti-48.3at.%Ni thin films annealed at 873 K for 3.6 ks do not show any ductility. The difference in the ductility of the Ti-48.3at.%Ni thin films can be explained by grain-boundary precipitates of Ti2Ni. (orig.)
Additional details
Publishing Information
- Journal Title
- Materials Science and Engineering. A, Structural Materials: Properties, Microstructure and Processing
- Journal Volume
- 273-275
- Journal Page Range
- p. 754-757
- ISSN
- 0921-5093
- CODEN
- MSAPE3
Conference
- Title
- International conference on martensitic transformations (ICOMAT '98)
- Dates
- 7-11 Dec 1998
- Place
- San Carlos de Bariloche (Argentina)
INIS
- Country of Publication
- Netherlands
- Country of Input or Organization
- Switzerland
- INIS RN
- 31013031
- Subject category
- S36: MATERIALS SCIENCE;
- Resource subtype / Literary indicator
- Conference
- Descriptors DEI
- ANNEALING; COATINGS; DEPOSITION; DUCTILITY; GRAIN BOUNDARIES; NICKEL ALLOYS; PRECIPITATION; SHAPE MEMORY EFFECT; SPUTTERING; TENSILE PROPERTIES; TITANIUM ALLOYS
- Descriptors DEC
- ALLOYS; HEAT TREATMENTS; MECHANICAL PROPERTIES; MICROSTRUCTURE; SEPARATION PROCESSES; TENSILE PROPERTIES; TRANSITION ELEMENT ALLOYS
Optional Information
- Notes
- 17 refs.