Published August 2007
| Version v1
Journal article
Synthesis of Crystalline Carbon Nitride Thin Films by Pulsed Arc Discharge at Atmospheric Pressure
Creators
- 1. Basic Department, Beijing Institute of Clothing Technology, Beijing 100029 (China)
- 2. School of Material Science and Technology, Wuhan Institute of Technology, Wuhan 430073 (China)
Description
The preparation of crystalline C3N4 films was investigated using pulsed arc discharge from mixed methanol and ammonia water at atmospheric pressure. The X-ray diffraction (XRD) patterns of the films prepared at a substrate temperature of 450 deg. C suggested that the film was composed of α-C3N4 and β-C3N4 crystallites. Raman spectra exhibited distinct peaks which are in good agreement with those predicted theoretically for C3N4 crystallites
Additional details
Identifiers
Publishing Information
- Journal Title
- Plasma Science and Technology
- Journal Volume
- 9
- Journal Issue
- 4
- Journal Page Range
- p. 460-462
- ISSN
- 1009-0630
INIS
- Country of Publication
- China
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 39050841
- Subject category
- S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY;
- Descriptors DEI
- AMMONIA; ATMOSPHERIC PRESSURE; CARBON NITRIDES; CRYSTALS; ELECTRIC ARCS; METHANOL; RAMAN SPECTRA; SUBSTRATES; SYNTHESIS; THIN FILMS; X-RAY DIFFRACTION
- Descriptors DEC
- ALCOHOLS; CARBON COMPOUNDS; COHERENT SCATTERING; CURRENTS; DIFFRACTION; ELECTRIC CURRENTS; ELECTRIC DISCHARGES; FILMS; HYDRIDES; HYDROGEN COMPOUNDS; HYDROXY COMPOUNDS; NITRIDES; NITROGEN COMPOUNDS; NITROGEN HYDRIDES; ORGANIC COMPOUNDS; PNICTIDES; SCATTERING; SPECTRA