Microstructure of pulsed laser deposited Ti, TiN and TiO thin layers

Complex structural examinations were performed on thin layers of Ti, TiN and TiO obtained by means of pulsed laser deposition (PLD). Influence of deposition parameters on the film morphology was under examination. The received films revealed an uniform nanostructure. Appearance of a tetragonal Ti-phase was stated in the deposited Ti layers in argon atmosphere. The TiN-phase was formed independently of the nitrogen flow. By increasing concentration of oxygen in the chamber, transition of the oxides from Ti2O via TiO to TiO2 was observed. TEM examination of cross-sections of Ti layers revealed a micro-columnar structure as well as verified the existence of the tetragonal phase. The deposited TiO layer was characterized by a [001] texture. Measurement of the residual stresses of the I-st order in TiN layers showed the level of -5 to -7 GPa and ± 8GPa for the II-nd order. (author)