Development of oriented metallic patterns using LIGA process for focused anti-scatter grid application

X-ray projection imaging is troubled by beam scattering. Anti-scatter grids selectively remove such scattered X-rays and are classified as focused or unfocused, depending on the lamellar angle. Focused grids afford better transmittance than unfocused grids, but it is difficult to fabricate inclined microstructures with different angles. Here, we present a novel method for the fabrication of anti-scatter grids on bendable substrates. We utilized a synchrotron X-ray lithography process to obtain unique microstructures and subsequent copper-based electroforming process for metallization. Finally, lamellar micro-patterns were successfully realized with different angles according to each location of the focused anti-scatter grid application. (author)