Magnetron-type radio-frequency plasma control yielding vertically well-aligned carbon nanotube growth

In order to understand the effects of plasma parameters on the nanotube formation and further controlled growth, we have investigated the optimal growth condition using a rf plasma-enhanced chemical vapor deposition method. The magnetic field introduced for a magnetron discharge enhances the nanotube growth as a result of the plasma-density increment and the self-bias reduction of a rf electrode. It is also found that the optimum ion flux and ion bombardment energy is a key parameter for the uniform, well-aligned, and density-controlled nanotube growth