Published April 18, 2011 | Version v1
Journal article

Improved tunneling magnetoresistance at low temperature in manganite junctions grown by molecular beam epitaxy

  • 1. Physikalisches Institut-Experimentalphysik II, Universitaet Tuebingen, Auf der Morgenstelle 14, 72076 Tuebingen (Germany)
  • 2. TASC National Laboratory, CNR-IOM, S.S. 14 Km 163.5 in AREA Science Park, 34012 Basovizza, Trieste (Italy)
  • 3. Universidad Nacional de Colombia, Sede Manizales, Cra 27 64-60 Manizales (Colombia)

Description

We report resistance versus magnetic field measurements for a La0.65Sr0.35MnO3/SrTiO3/La0.65Sr0.35MnO3 tunnel junction grown by molecular-beam epitaxy, that show a large field window of extremely high tunneling magnetoresistance (TMR) at low temperature. Scanning the in-plane applied field orientation through 360 deg., the TMR shows fourfold symmetry, i.e., biaxial anisotropy, aligned with the crystalline axis but not the junction geometrical long axis. The TMR reaches ∼1900% at 4 K, corresponding to an interfacial spin polarization of >95% assuming identical interfaces. These results show that uniaxial anisotropy is not necessary for large TMR, and lay the groundwork for future improvements in TMR in manganite junctions.

Additional details

Identifiers

Publishing Information

Journal Title
Applied Physics Letters
Journal Volume
98
Journal Issue
16
Journal Page Range
p. 162505-162505.3
ISSN
0003-6951
CODEN
APPLAB

Optional Information

Notes
(c) 2011 American Institute of Physics