Published April 2011 | Version v1
Journal article

Nickel-plating for active metal dissolution resistance in molten fluoride salts

  • 1. Department of Engineering Physics, 1500 Engineering Drive, University of Wisconsin, Madison, WI 53706 (United States)

Description

Ni electroplating of Incoloy-800H was investigated with the goal of mitigating Cr dissolution from this alloy into molten 46.5%LiF-11.5%NaF-42%KF eutectic salt, commonly referred to as FLiNaK. Tests were conducted in graphite crucibles at a molten salt temperature of 850 deg. C. The crucible material graphite accelerates the corrosion process due to the large activity difference between the graphite and the alloy. For the purposes of providing a baseline for this study, un-plated Incoloy-800H and a nearly pure Ni-alloy, Ni-201 were also tested. Results indicate that Ni-plating has the potential to significantly improve the corrosion resistance of Incoloy-800H in molten fluoride salts. Diffusion of Cr from the alloy through the Ni-plating does occur and if the Ni-plating is thin enough this Cr eventually dissolves into the molten salt. The post-corrosion test microstructure of the Ni-plating, particularly void formation was also observed to depend on the plating thickness. Diffusion anneals in a helium environment of Ni-plated Incoloy-800H and an Fe-Ni-Cr model alloy were also investigated to understand Cr diffusion through the Ni-plating. Further enhancements in the efficacy of the Ni-plating as a protective barrier against Cr dissolution from the alloy into molten fluoride salts can be achieved by thermally forming a Cr2O3 barrier film on the surface of the alloy prior to Ni electroplating.

Availability note (English)

Available from http://dx.doi.org/10.1016/j.jnucmat.2011.01.032

Additional details

Identifiers

DOI
10.1016/j.jnucmat.2011.01.032;
PII
S0022-3115(11)00055-9;

Publishing Information

Journal Title
Journal of Nuclear Materials
Journal Volume
411
Journal Issue
1-3
Journal Page Range
p. 51-59
ISSN
0022-3115
CODEN
JNUMAM

Optional Information

Copyright
Copyright (c) 2011 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.